| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask and an exposure apparatus capable of achieving an exposure operation with high productivity. <P>SOLUTION: Since a transmitting part Mb penetrates a mask M, a product (e.g. a sublimated substance) emitted from a resist R applied on the upper face of a workpiece W is not stuck on the penetrated transmitting part Mb. Consequently, the quantity of transmission light is not decreased and periodical cleaning of the mask M is needed, which increases production efficiency. <P>COPYRIGHT: (C)2009,JPO&INPIT |
