| 摘要 |
PURPOSE:The titled composition which is excellent in adhesion to a substrate such as glass, chemical resistance and mechanical strength and can form a pattern of a high density and a high resolution, comprising a specified graft copolymer, an epoxy resin and a polymerization initiator. CONSTITUTION:A graft copolymer consisting of a trunk chain based on at least one monomer selected from among alkyl (meth)acrylates and styrene and a branch chain grafted thereupon and based on at least one monomer selected from among hydroxyl group-containing acryl or vinyl monomers, (alkyl) amino group-containing acrylic monomers, carboxyl group-containing acryl or vinyl monomers, N-vinylpyrrolidone (derivatives), vinylpyridine (derivatives) and acrylamide derivatives of the formula (wherein R<1> is H, a 1-3C alkyl, hydroxyalkyl and R<2> is H or a 1-4C hydroxylalkyl or aryl) is mixed with an epoxy resin having at least one epoxy group and a polymerization initiator which can generate a Lewis acid upon irradiation. |
