发明名称 MATERIAL FOR PHOTOSENSITIVE RESIN PLATE
摘要 PURPOSE:To shorten the exposure time and to improve the work efficiency by using a prescribed acrylic ester as at least part of a polymerizable monomer in a photosensitive layer contg. a polymer, the polymerizable monomer and a photopolymn. initiator as essential components. CONSTITUTION:A photosensitive layer contg. a polymer, a polymerizable mono mer and a photopolymn. initiator as essential components is formed to obtain a material for a photosensitive resin plate. At this time, an acrylic ester represented by chemical formula I is used as at least part of the polymerizable monomer. In the formula I, R<1> is H or methyl, each of R<2> and R<3> is H, -A'-OH, -(A''O)nH or -A-OOC-R<1>C=CH2, R<2> and R<3> are not simultaneously H or -A- OOC-R<1>C=CH2, each of A, A' and A'' is lower alkylene having optionally hy droxyl, and n is an integer of 1-20. The acrylic ester represented by the formu la I has satisfactory solubility in water and shows high sensitivity in case where each of R<2> and R<3> is alkyl or polyoxyalkylene having no hydroxyl.
申请公布号 JPS62950(A) 申请公布日期 1987.01.06
申请号 JP19850140928 申请日期 1985.06.26
申请人 NIPPON PAINT CO LTD 发明人 UMEDA YASUSHI;KIMOTO KOICHI
分类号 C08F20/00;C08F2/48;C08F20/32;C08F20/34;G03F7/004;G03F7/027 主分类号 C08F20/00
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