| 摘要 |
Disclosed is a two-component developer composition enabling smudge resistant images which is comprised of improved two-component contamination free developer composition comprised of (1) magnetite; (2) a polyester resin comprised of the polymeric esterification product of a dicarboxylic acid and a diol comprising a diphenol of the following formula <IMAGE> wherein R is selected from substituted and unsubstituted alkylene radicals of from about 2 to about 12 carbon atoms, alkylidene radicals of from 1 to 12 carbon atoms and cycloalkylidene radicals of from 3 to 12 carbon atoms; R' and R'' are selected from substituted and unsubstituted alkylene radicals of from 2 to 12 carbon atoms, alkylene arylene radicals of from 8 to 12 carbon atoms and arylene radicals; X and X' are selected from hydrogen or any alkyl radical having from 1 to 4 carbon atoms; and each n is a number of from 0 (zero) to 4; and (3) carrier particles.
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