发明名称 METHOD AND APPARATUS FOR COATING SEMICONDUCTIVE MATERIALS
摘要 Excessive heat-generating current levels produced in semiconductive materials by electrostatically assisted coating apparatus employed to, for example, improve the uniformity of a coating applied to such materials are avoided by passing an auxiliary current through said semiconductive materials in the same region and in a direction opposite to that of the current produced by said electrostatically assisted coating apparatus such that the difference between the said current produced by said electrostatically assisted coating apparatus and the said auxiliary current is less than or equal to a predetermined value.
申请公布号 DE3274199(D1) 申请公布日期 1987.01.02
申请号 DE19823274199 申请日期 1982.01.04
申请人 POLAROID CORPORATION 发明人 KISLER, SEMYON
分类号 B05C5/02;B05C9/08;B05C11/02;B05D1/00;B05D1/26;B05D3/12;B05D3/14;G03C1/74;H01L21/56;(IPC1-7):B05D1/00;G03C1/00 主分类号 B05C5/02
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