| 摘要 |
A capacitively coupled plasma reactor is provided to uniformly generate the plasma of the high density by uniformly controlling the current supply of the capacitively coupled electrode. An inductively coupled plasma reactor comprises a plasma reactor(10), a gas supply part(20), a capacitively coupled electrode assembly(30), a main power supply source(40), and an allotter circuit(50). A support stand(12) on which a processed substrate(13) is put is equipped in the plasma reactor. The gas supply part is mounted on the top of the capacitively coupled electrode assembly and supplies the gas through a gas injecting hole(32) of the capacitively coupled electrode assembly to the inside of the plasma reactor. The capacitively coupled electrode assembly comprises a plurality of capacitively coupled electrodes for inducing the plasma discharge inside the plasma reactor. The allotter circuit distributes the wireless frequency power source provided from the main power supply source to a plurality of capacitively coupled electrodes. |
