发明名称 METHOD FOR SUPPLYING SOURCE GAS
摘要 A method for supplying a source gas is provided to predict an amount of source material remaining to a storage part of the source material by supplying the source gas to a deposition chamber after evaporating the source material stored in the storage part into a source gas. Gas pressure of a source material storage part(110) is maintained into a first pressure. The gas pressure of the source material storage part is maintained into a second pressure by sending a measuring gas to the source material storage part. An amount of a source material(120) remaining to the source material storage part is accurately predicted by an amount of the measuring gas required until the gas pressure of the source material storage part is delivered from the first pressure to the second pressure. A manometer(200) is connected to the source material storage part, and measures the gas pressure of the source material storage part. The measuring gas is an inert gas like Ar.
申请公布号 KR20090060883(A) 申请公布日期 2009.06.15
申请号 KR20070127860 申请日期 2007.12.10
申请人 TERASEMICON CORPORATION 发明人 JANG, TAEK YONG;LEE, BYOUNG IL
分类号 H01L21/02;H01L21/205 主分类号 H01L21/02
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