| 摘要 |
<p>PURPOSE:To reduce the number of producing stages, especially, the number of patterning stages to two times by providing the structure of a metal-insulator- transparent electric conductor to a thin film two-terminal element and by using a metallic oxide type electric conductor made of the same material as an image element electrode as the transparent electric conductor. CONSTITUTION:The structure of a metal-insulator-metallic oxide type electric conductor is provided to a thin film two-terminal element, and the metallic oxide type electric conductor is made of the same material as an image element electrode. A lower glass substrate 1 is coated with a glass protecting film 2, a thin Ta film is formed on the film 2 by sputtering and patterned by photolithography to form a lead electrode 3, and the surface of the electrode 3 is anodically oxidized to form an insulator layer 4 of Ta2O5. A transparent electrode is directly formed on the layer 4 and patterned by photo-lithography to form a lower transparent electrode 5.</p> |
