发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain the titled composition having a high sensitivity and an excellent film forming property, and an anti printing and a heat-resisting properties. CONSTITUTION:The titled composition is composed of a photosensitive compd. having a substd. or an unsubstd. benzophenone structure and a o-quinone diazide group in a molecule. The prescribed positive type photosensitive composition has the high sensitivity and the excellent fine working property, and is suitable to be used as the super-fine working resist material in a manufacture of IC and LSI elements, and also as the photosensitive material in a manufacture of a lithographic plate.
申请公布号 JPS61295549(A) 申请公布日期 1986.12.26
申请号 JP19850138143 申请日期 1985.06.25
申请人 DAINIPPON INK & CHEM INC 发明人 TANAKA SHIGEHIRO;SHOJI TOSHIHIRO;OTSUKA SHUNICHI
分类号 C08G59/00;C08G59/18;C08L63/00;G03C1/72;G03F7/008;G03F7/022 主分类号 C08G59/00
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