| 摘要 |
PURPOSE:To obtain a photoconductive member having excellent electrostatic chargeableness, low residual potential, high sensitivity over a wide wavelength region, good adhesiveness to a substrate and excellent environment resistance by using microcrystalline silicon in at least part of the photoconductive member. CONSTITUTION:The photoconductive layer of the photoconductive member having a conductive base 21 and the photoconductive layer has the 1st layer 23 at least part of which consists of microcrystalline silicon contg. hydrogen and the 2nd layer 24 consisting of amorphous silicon contg. hydrogen and carbon. The 1st layer 23 and the 2nd layer 24 are laminated in the layer thickness direction of the photoconductive layer. The photoconductive member which has high resistance and excellent electrostatic charge characteristic, has the high photosensitive characteristic in visible light and near IR region, permits easy production and has high practicability is thus obtd. |
