| 摘要 |
PURPOSE:To obtain the titled composition having a good sensitivity, and an excellent resolution and anti-dry etching properties, comparing with the conventional composition composed of a polyvinyl carbazole and a polystyrene by applying a mixture of a specific polymer and a bisazide compd. to a photoresist. CONSTITUTION:The titled composition is composed of the resist composed of 100pts.wt. the polymer having a repeating unit shown by the formula and a mol.wt. of 2,000-100X10<4> and 0.1-30pts.wt. the bisazide compd. When the titled composition has <2,000mol.wt., the glass transition point depresses, and the high polymer is not obtd. When the titled composition has >100X10<4>mol.wt., the coating and resolution properties are reduced. The molecular weight distribution of the used polymer is the monodisperse, or almost near to the monodisperse from the resolution point of view. If the compounding amount of the bisazide compd. to the titled composition is <0.1pts.wt., the effect of the addition is remarkably reduced. While if the prescribed amount is >30pts. wt., adversely, the depression of the resolution generates. |
