发明名称 METHOD AND APPARATUS FOR FORMING ACCUMULATED FILM BY PHOTOCHEMICAL VAPOR PHASE GROWTH METHOD
摘要 PURPOSE:To form an accumulated film which is uniform and homogeneous and has high performance by using an optical system incorporating a multilayered dielectric mirror as a means supplying the high energy beam. CONSTITUTION:A preliminarily mixed gaseous raw material is introduced into the inside of a reaction vessel 1 via a feed pipe 4. The gaseous raw material incorporated in the reaction vessel 1 is irradiated via the mirror groups 111-115 and a light transmission plate 10 with a luminous flux 7 radiated from a high energy beam generating means 8 and the gaseous raw material is excited, decomposed and polymerized by a photochemical reaction and an accumulated film is formed on a base material 3. As the mirror groups 111-115, a spherical surface aluminum mirror, a plane aluminum mirror, two sheets of plane multilayered film aluminum mirrors and a spherical aluminum mirror are provided in order from a side near to the high energy beam generating means 8. When two sheets of plane multilayered film dielectric mirrors are especially provided in a 2-sheet set so that these are made to a chevron type and the incident angle is regulated to 45 deg., the shading can be corrected.
申请公布号 JPS61295373(A) 申请公布日期 1986.12.26
申请号 JP19850136844 申请日期 1985.06.25
申请人 CANON INC 发明人 ECHIZEN YUTAKA
分类号 C23C16/48;G03G5/08 主分类号 C23C16/48
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