| 摘要 |
PURPOSE:To make pattern drawing possible without the sizing processing which requires the computer a considerable time, by applying the connection information between the sizing operation circuit combined with the hardware provided with the electron beam lithography equipment and the shot. CONSTITUTION:The shot data in the shot data memory part 20 are transferred to the buffer memory 50 prior to pattern drawing, and then transferred in the shot sequence to the sizing operation circuit 40. In this circuit, the operation of the shot data and the sizing quantity previously transferred is performed together in accordance with the connection information. The shot data subjected to sizing are transferred to the control system, and the actual shot is executed. Although the connection information can be added by the program to convert the design data to the shot data, they can be produced in the equipment in the case of electron beam lithography equipment which has the circuit to develop data repeatedly or the circuit to divide the shot data furthermore.
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