| 摘要 |
The invention concerns a process for ultra-drying of a gas or gas mixture by bringing this into contact with a silicate containing material. In order to obtain a residual water level of 5 ppb or less, the invention is characterized in that the gas or gas mixture is brought into contact with a silcate containing material, preferably a zeolite or silicagel, that has been modified with silane, borane, and/or the alkyl and/or halogen substituted compounds thereof. The invention is further concerned with the separation of tritium oxide from gas mixtures preferably with water. |
