| 摘要 |
It has been found that, if a (negative) bias is applied to a substrate during the sputtering thereto of Alfesil, selective re-sputtering from the substrate film of aluminum and silicon will leave that film rich in iron and, attendantly, of higher saturation magnetization (17,000 gauss) than the starting material Alfesil (10,000 gauss). Such being the case, the invention provides that the sputtering of Alfesil-type material during the manufacture of a magnetic head be performed in two phases, first, while applying a bias of a first sense to a substrate to be sputtered upon, and, second, while applying a bias of different sense (e.g. a zero bias) to the substrate, thereby to cause a composite thin film to be formed on the substrate. The composition of the thin film in question is: 1. a (generally thin) region of material of high saturation magnetization layered with 2. a (generally thicker) region of lesser saturation magnetization.
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