| 发明名称 |
Method for manufacturing a narrow line of photosensitive material |
| 摘要 |
A portion (28) of photosensitive material is created by an underetching/shadowing technique in such a manner as to have an extremely narrow width.
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| 申请公布号 |
US4631113(A) |
申请公布日期 |
1986.12.23 |
| 申请号 |
US19850812538 |
申请日期 |
1985.12.23 |
| 申请人 |
SIGNETICS CORPORATION |
发明人 |
DONALD, RAYMOND G. |
| 分类号 |
H01L21/306;G03F7/00;G03F7/09;H01L21/027;H01L21/30;H01L21/302;H01L21/3065;H01L21/336;H01L21/8234;H01L29/78;(IPC1-7):B44C1/22;B29C17/08;C03C15/00;C23F1/02 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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| 主权项 |
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