| 摘要 |
<p>ELECTROLYTIC STRIPPING BATH AND PROCESS An improved electrolytic bath composition and process for stripping relatively thick copper, copper alloy, or chromium deposits from a ferrous basis metal comprising an aqueous solution having a pH of from about 1 to about 14 and consisting essentially of an amine, nitro, and/or nitrate stripping component; and sodium glucoheptonate present in an effective amount to inhibit attack of the basis metal. The solution may further include at least one bath soluble compound selected from the group consisting of malic acid, oxalic acid, and mixtures thereof, as well as the Group IA, IIA, and ammonium salts thereof, present in an effective amount, when combined with said sodium glucoheptonate, to inhibit attack of the basis metal; and/or a carboxylic acid buffering agent comprising at least one material selected from the group consisting of gluconic acid, lactic acid, tartaric acid, fumaric acid, citric acid, isoascorbic acid, succinic acid, acetic acid, and mixtures thereof, as well as the alkali metal and ammonium salts thereof. The stripping of the metal deposit is effected by immersion of the object in the bath while anodically charged and passing electric current through the bath to a cathode for a period of time sufficient to achieve the desired magnitude of stripping of the metal deposit.</p> |
