发明名称 METHOD AND APPARATUS FOR INSPECTING DEFECT
摘要 PURPOSE:To inspect fine foreign matters and pattern defects with high sensitivity by eliminating regularly arranged defect informations in defect informations obtained from the whole surface of a body to be inspected as informations for a circuit pattern, etc. and detecting only residual defect informations. CONSTITUTION:In a CPU 24, the frequency distribution of foreign matters detected is prepared, and the frequency of foreign matters in the coordinates of foreign matters detected is inspected after the completion of the inspection of the whole surface. In the frequency distribution of foreign matters, a foreign matter counter is counted to +1 when detecting foreign matters, and the X, Y coordinates of foreign matters are memorized. The contents of the positions of the frequency distribution of X are counted to +1 and the contents of the positions of the frequency distribution of Y to +1 at the same time. Inspection is completed and the X, Y coordinates of foreign matters are read in succession, and the memorized X, Y coordinates are annihilated as data except foreign matters and circuit patterns when the frequency of foreign matters in the X direction extends over a threshold 32 or more and the frequency of foreign matters in the Y direction a threshold 33 or more, and the foreign matter counter is counted to -1. The operation is conducted regarding all detected foreign matters, thus memorizing and displaying the number and X, Y coordinates only of true foreign matters.
申请公布号 JPS61292931(A) 申请公布日期 1986.12.23
申请号 JP19850134081 申请日期 1985.06.21
申请人 HITACHI LTD 发明人 OSHIMA YOSHIMASA;KOIZUMI MITSUYOSHI
分类号 G01B11/30;G01N21/88;G01N21/94;G01N21/956;H01L21/66 主分类号 G01B11/30
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