发明名称 |
Method for producing porous copper foil |
摘要 |
The present invention provides a method for producing a porous copper foil. The method of the present invention includes the steps of forming an oxide film by providing a chromium-containing compound to a metal surface of a cathode; forming a copper foil on the oxide film by performing electrolysis of copper; and removing the copper foil from the metal surface of the cathode. The method of the present invention is simple and time-saving, and the porous copper foil of the present invention has reduced roughness difference between both sides of the porous copper foil. |
申请公布号 |
US9365940(B2) |
申请公布日期 |
2016.06.14 |
申请号 |
US201113004310 |
申请日期 |
2011.01.11 |
申请人 |
Chang Chun Petrochemical Co., Ltd. |
发明人 |
Tsai Chen-Ping;Chou Jui-Chang;Cheng Kuei-Sen |
分类号 |
C25D3/38;C25D17/00;F16M13/00;F16M11/04;C25C1/12;C25D1/04;H01M4/66;H01M10/052 |
主分类号 |
C25D3/38 |
代理机构 |
Polsinelli PC |
代理人 |
Polsinelli PC |
主权项 |
1. A method for producing a porous copper foil, comprising the steps of:
transferring a chromium-containing compound to a metal surface of a cathode, the transferring of the chromium-containing compound to the metal surface being achieved without applying voltage on the metal surface; rotating the cathode comprising the chromium containing compound into immediate contact with an electrolytic solution, the electrolytic solution comprising copper ions; depositing a copper foil on the cathode containing the chromium-containing compound by performing electrolysis of copper; and removing the copper foil from the metal surface of the cathode to obtain a porous copper foil having a difference in surface roughness Rz between the as deposited matte side and the as deposited shiny side of the copper foil in the range of 1.85-3.36 μm. |
地址 |
Taipei TW |