发明名称 |
Photochemical vapor deposition process for depositing oxide layers |
摘要 |
An improved process for depositing an oxide layer on a substrate by exposing the substrate to a selected vapor phase reactant and an oxygen-containing precursor comprising nitrous oxide mixed with molecular oxygen in a predetermined ratio, in the presence of radiation of a selected wavelength. The radiation causes the direct dissociation of the oxygen-containing precursor to form neutral oxygen atoms that react with the vapor phase reactant and form the oxide, which deposits as a layer on the substrate. The rate of reaction to form and deposit the oxide layer is enhanced by the mixing of molecular oxygen with nitrous oxide in the precursor.
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申请公布号 |
US4631199(A) |
申请公布日期 |
1986.12.23 |
申请号 |
US19850757562 |
申请日期 |
1985.07.22 |
申请人 |
HUGHES AIRCRAFT COMPANY |
发明人 |
HALL, JAMES T.;PETERS, JOHN W. |
分类号 |
C23C16/40;C23C16/48;H01L21/316;(IPC1-7):C23C16/50 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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