发明名称 VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To make an evaporation device using a light beam practicable by passing gas from the window side into a protective pipe provided in continuation with the light beam introducing window to an admission path for the light beam thereby preventing the sticking of a vaport deposition material to the window. CONSTITUTION:The laser beam 16 is introduced through the introducing window 19 into an evaporation vessel 11 and irradiated to a reflecting mirror 17 by passing through a slit 18' provided at the front end of the protective pipe 18. The gas is introduced through a gas introducing port 20 into the pipe 18 so that the arrival of the vapor evaporating from an evaporating material 12 coming from the opposite side at the window 19 is prevented. The beam 16 reflected by the mirror 17 is irradiated to the material 12 by which the material 12 is evaporated. The evaporating vapor is deposited on a sample 13 and the film deposited by evaporation is thus formed.
申请公布号 JPS61291966(A) 申请公布日期 1986.12.22
申请号 JP19850133428 申请日期 1985.06.19
申请人 AGENCY OF IND SCIENCE & TECHNOL;MITSUBISHI HEAVY IND LTD 发明人 MINETA YUKISHIGE;YASUNAGA NOBUO;TARUMI NOBORU;TESHIGAHARA EIICHI;IKEDA MASAYUKI;ODOHIRA TOSHIHIKO;WADA TETSUYOSHI;ITANO SHIGEO
分类号 C23C14/28 主分类号 C23C14/28
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