发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To uniformly form the compsn. of a thin alloy film and to obtain the compsn. stable to continuous sputtering by disposing the divided pieces of a metal or alloy to a target body coaxially with the center of said body. CONSTITUTION:The target body 2 consisting of any of a metal such as Te, alloy such as ZnSe or compd. such as Al2O3 is adhered by a bonding layer 3 consisting In alloy material onto a backing plate 1 made of copper, etc. Plural pieces of the divided pieces 5 of, for example, the metal such as Sn, Pd or the alloy thereof different from the body 2 are imposed or embedded onto or into such target so as to be positioned coaxially with the center of the body 2. Each of the pieces 5 preferably forms part of a ring shape having a specified width. Each of the pieces 5 is preferably circular. Each of plural pieces of the above-mentioned metal or alloy is also preferably square.
申请公布号 JPS61291968(A) 申请公布日期 1986.12.22
申请号 JP19850132278 申请日期 1985.06.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUBARA KUNIHIRO;OOTA TAKEO;INOUE KAZUO
分类号 G11B7/26;C23C14/34;G11B11/10;G11B11/105 主分类号 G11B7/26
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