| 摘要 |
PURPOSE:To measure the range and the sectional shape of a pattern at a high speed and a high accuracy, by extracting a parameter of a pattern shape from the signal waveform of a scan electron microscope (SEM) to select the optimum template waveform. CONSTITUTION:A mechanism 2 for varying the inclination of a sample base is used to determine two SEM signal waveforms different in the irradiation angle of electron beam and first, rough edge positions of the waveforms are detected with detector sections 8 and 9. Besed on the edge positions, a parameter computing section 10 composed of a computer determines a rough height of a pattern edge and the angle of inclination of a slope. Then, based on the height and the angle of inclination, acceleration voltage, beam diameter, pattern material and the like, a template computing section 11 determines the optimum template waveform near the edge to be stored into memories 12 and 13 as the model waveform. The waveform detected is compared with the model waveform by matching sections 14 and 15 to detect a highly accurate edge position and a shape computing section 16 determines the range and sectional shape of a pattern at a high speed and at a high accuracy.
|
