发明名称 SIMPLE RESIN PHOTOMECHANICAL PROCESS METHOD
摘要 PURPOSE:To permit precision transfer by using an exposing device constituted of a frame body, bottom plate and fasteners to fasten the same to bring a process original plate and photosensitive resin plate into tight contact with each other. CONSTITUTION:The exposing device to be used for the photomechanical process of the photosensitive resin plate is constituted of the frame body 1, the bottom cap 6 and the fasteners 8. The body 1 consists of an inside frame 2 and an outside frame 3 and a thin glass sheet 5 is fitted via a gasket 4 to the frame 2. The process original plate and photosensitive resin plate which are held superposed on each other are inserted between the body 1 and the cap 6 in the above-mentioned constitution and are fastened by means of the fasteners 8. The plates are subjected in this state to the prescribed exposing, then to washing, by which the photoengraving is executed. The tight contact of the original plate and the resin plate is thereby attained and the precision transfer is permitted.
申请公布号 JPS61290450(A) 申请公布日期 1986.12.20
申请号 JP19850132651 申请日期 1985.06.18
申请人 NAKADA NOBUHIRO 发明人 NAKADA NOBUHIRO
分类号 G03F7/00;G03F7/20 主分类号 G03F7/00
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