发明名称 COATING APPARATUS
摘要 PURPOSE:To prevent the re-adhesion of a scattered coating solution to the surface of an article to be coated by catching the splash of said coating solution, by providing a large number of needle like projections of which the leading end parts are protruded to the internal direction of a coating part to the inner peripheral wall surface of a coating cup in an implanted state. CONSTITUTION:A spinner 2 is rotated at a predetermined angle through a rotary shaft 2 and a coating cup 1 is evacuated through a duct 7. When a predetermined amount of a photoresist 6 is dripped from a dripping nozzle 5 in this state, said photoresist 6 is dispersed to the entire surface of a wafer 4 by centrifugal force to be uniformly applied thereto. Because the excessive photoresist 6 scattered from the peripheral part of the wafer 4 is caught between a large number of needle like projections 8 comprising glass fibers implanted in the inner peripheral wall surface of the coating cup 1, it is prevented that said photoresist is impinged to the wall surface and splashed to be adhered to the film formed on the wafer 4.
申请公布号 JPS61291068(A) 申请公布日期 1986.12.20
申请号 JP19850131882 申请日期 1985.06.19
申请人 HITACHI LTD 发明人 SHIRAI SEIICHIRO
分类号 B05C11/08;G03F7/16;H01L21/027 主分类号 B05C11/08
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