| 摘要 |
PURPOSE:To enhance sensitivity by incorporating metal microparticles capable of absorbing X-rays and releasing secondary electrons in an electron-sensitive composition containing a monomer or a resin. CONSTITUTION:The X-ray resist is obtained by dispersing the metal microparticles capable of absorbing X-rays and releasing secondary electrons into the electron-sensitive composition containing a monomer and/or a resin, preferably, in an amount of 0.1-70wt% of said composition, thus permitting the metal microparticles to efficiently absorb irradiated X-rays and to release secondary electrons, and to effectively affect the electron sensitive composition, and accordingly, the obtained resist to have high sensitivity to X-ray exposure. |
