| 摘要 |
PURPOSE:To obtain a copolymer which can be decomposed highly sensitively when exposed to light, electron beams or X rays and is useful as a positive resist material, by copolymerizing sulfur dioxide with phenylacetylene. CONSTITUTION:Sulfur dioxide is mixed with phenylacetylene. After the addition of an organic solvent, the mixture is copolymerized by heating, irradiation with light or a radical polymerization initiator. In this way, the purpose copolymer which is a linear compound consisting of 50-99mol% structural units of formula I and 1-50mol% structural units of formula II and has a number- average MW of 500-500,000 is obtained. An example of the structural formula of said copolymer is formula III, wherein m is 1-99, n is 1-99, x is 0-1,200, and y is 0-1,200, provided that the case of x=y=0 is excluded. Examples of the solvents used include tetrahydrofuran, dimethyl sulfoxide and dioxane. |
