| 摘要 |
PURPOSE:To obtain a reflection prevention/increasing optical film excellent in adhesive properties, solvent resistance and the environment resistance by providing a shielding body of a vapor deposition substance to a lower part of a dome mounting a substrate of a film formation object in the titled film formation device. CONSTITUTION:A dome 2 is provided to a ceiling part of the inside of a cylindrical film formation chamber 1 and the glass substrates 3 as a film formation object are mounted on the upside thereof and irradiation device 5 irradiating the ion beams 4 to the substrates 3, the resistance heating source 6a, 6b and an EB gun vapor deposition source 7 are provided on a floor of the chamber 1. To the device 5 a pipeline introducing gaseous Ar into the inside of an ion beam chamber is connected and a gas introduction valve 8 is provided. The device 5 is positioned at a out of center of the chamber 1 and irradiates slantingly the beam 4 to the semicircle of the dome 2 from a peripheral edge position of one hand of the inside of the chamber and the dome 2 is turned to irradiate the beams 4 on the whole substrates. A shielding body 9 is provided to the lower part of the semicircle of the dome 2 in a side wherein the beams 4 are not irradiated and thereby the vapor deposition substance to the part other than the required region is shielded. |
