| 摘要 |
Provided is a method for manufacturing a multi-gray scale photomask for manufacturing a display device without generating pattern degradation due to wet etching and alignment dislocation, and forming a transfer pattern having an edge of a light transmitting portion and a light shielding portion, and an edge of a semi-light transmitting portion and a light shielding portion, at a fixed density. In the case of a method for manufacturing a multi-gray scale photomask having a transfer pattern having a light shielding portion, a semi-light transmitting portion, and a light transmitting portion formed by separately patterning a light shielding film and a semi-light transmitting film formed on a transparent substrate, the transfer pattern has a portion in which the light shielding portion is adjacent to the light transmitting portion and a portion in which the semi-light transmitting portion is adjacent to the light transmitting portion. In addition, in the case of the method for manufacturing a multi-gray scale photomask, the multi-gray scale photomask has a predetermined process. |
