发明名称 METHOD AND APPARATUS FOR FORMING THIN FILM
摘要 PURPOSE:To quickly heat a substrate with low energy by depositing a thin film constituting material on the substrate to be formed with the thin film while bringing said substrate into direct contact with a heater. CONSTITUTION:The thin magnetic film is formed on a high-polymer film base 6 by, for example, a high-frequency discharge type opposed target sputtering device having a pair of targets T1, T2. The base 6 is conveyed from a supply roll 11 toward a take-up roll 13 while the base is guided by a cylindrical can 13 disposed alongside both targets between the same for the above-mentioned purpose. The magnetic particles are successively deposited on the base by sputtering during this time. A flexible heater 7 is wound on the circumferential surface (e.g., the surface to contact with the base 6) of the can 12 as the guiding member under rotation and the flexible base 6 is guided while contacting directly with such heater 7. The base 6 is then quickly heated with the smaller energy and the thin film having good characteristics is efficiently obtd.
申请公布号 JPS61288068(A) 申请公布日期 1986.12.18
申请号 JP19850129405 申请日期 1985.06.14
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 MATSUZAWA TAKAHIRO;ISHIBASHI SHOZO
分类号 C23C14/56;H01F41/18 主分类号 C23C14/56
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