发明名称 SEMICONDUCTOR SUBSTRATE TREATING DEVICE
摘要 PURPOSE:To maintain the temperature and pressure distributions during the treatment of a substrate uniform and to readily convey in or out the substrate by heating a container having horizontal racks to the prescribed temperature and driving the cover plate of an exit to close or open it. CONSTITUTION:The pitch of slits 5 of a cover plate 4 of a conveying exit of a container 1 is the same as that of racks 2, and the plate 4 is moved upward and downward by a cam 6 in cooperation with the operation of a conveyor. The racks 2 are placed with substrates to be treated, and heated. According to this construction, the temperature and pressure distributions in the container 1 become approximately uniform during the treatment of the substrate to uniformly treat the substrates and to readily convey the substrate in or out.
申请公布号 JPS61287231(A) 申请公布日期 1986.12.17
申请号 JP19850129658 申请日期 1985.06.14
申请人 TOSHIBA CORP 发明人 IMOTO YUKIO;TAKAHASHI YASUO
分类号 G03F7/26;H01L21/027;H01L21/30 主分类号 G03F7/26
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