| 摘要 |
PURPOSE:To stabilize the center of a focus, by providing a linear supporting part, which can support a wafer by linear contact and has a protruded cross section, on the surface of a stage. CONSTITUTION:On the surface of a stage 1, a linear supporting part 11, which can support a wafer 5 by a linear contact and has protruded trapezoidal cross section, is provided. The supporting part 11 is composed of a concentric protruded part 11a and radial protruded parts 11b, which are formed in the region of said protruded part 11a. Vacuum holes 12 are provided in order to keep vacuum pressure in a loop, which is formed by each protruded part 11a and each protruded part 11b with respect to the stage 1. A vacuum tool attaching hole 4 is provided. The wafer 5 is sucked to the linear supporting part 11 with vacuum by linear contact on the stage 1. Thus the wafer is fixed. Since the wafer chuck part of the wafer is constituted in contacting method of the plane and the lines, the effects of foreign materials are reduced, and the highly accurate device is obtained.
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