Resin composition for optical stereolithography

摘要

A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1):;
wherein R1, R2, and R3 represent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1)(R2)(R3)]”, and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E):
R4SH)p  (E)
wherein, R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.

主权项

1. A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D);
wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): wherein R1, R2, and R3 represent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the “cation [S+(R1)(R2)(R3)]”, and n is an integer in a range of 0 to 6; and wherein the resin composition further includes an aromatic thiol compound (E) represented by the following general formula (E):
R4SH)p  (E)wherein R4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2, and wherein a content of the aromatic thiol compound (E) is in a range of 0.1 to 5 mass % based on a mass of the aromatic sulfonium compound (C-1).