发明名称 |
MODIFIED POLYETHER SULFONE RESIN |
摘要 |
PURPOSE:The titled resin, obtained by irradiating polyether sulfone resin with ionizing radiation and having economically improved dimensional stability and heat resistance while retaining original physical properties of the resin. CONSTITUTION:A polyether sulfone resin having <=4.0X10<-5>cm/cm deg.C linear expansion coefficient at ordinary temperature - 200 deg.C, <=3.0% heat shrinkage of a film having 100mu thickness prepared by melt extrusion film forming method at 240 deg.C and >=6kgf/mm<2> tensile strength at ordinary temperature. The above- mentioned resin is obtained by irradiating polyether sulfone resin with ionizing radiation at 1-150Mrad, preferably 2-100Mrad dose.
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申请公布号 |
JPS61285228(A) |
申请公布日期 |
1986.12.16 |
申请号 |
JP19850127171 |
申请日期 |
1985.06.13 |
申请人 |
SUMITOMO BAKELITE CO LTD;NISSIN ELECTRIC CO LTD |
发明人 |
MUKAI SADAYOSHI;IINUMA TAKEHIKO;OZEKI YOSHINOBU;KATAYAMA KOICHI |
分类号 |
C08G75/00;C08G75/23;C08J3/28;H05K1/03;H05K3/00 |
主分类号 |
C08G75/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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