| 摘要 |
PURPOSE:To improve the productivity and the manufacturing yield by patterning and forming the reference information representing the manufacturing conditions of the substrate or the like in the blank region of the substrate by means of beam exposure. CONSTITUTION:In the pattern drawing by beam exposure, the required reference information (such as manufacturing conditions and the manufactural specifications) is previously input to input means 14, and this reference information is converted to reference information drawing pattern data by pattern conversion means 15. Then, in a drawing unit 12, during the controlled movement of the stage on which a hard blank is mounted in the X, Y directions, beam exposure is applied to the blank region 3 on the basis of said reference information pattern drawing data, and to the main pattern effective region 2 on the basis of the essentially needed mask pattern drawing data. Thereafter, by performing processed such as development and etching, a glass mask which has been patterned and formed is obtained.
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