| 摘要 |
PURPOSE:To provide micron- and submicron-sized scales which can be formed to optional sizes by using a holographic grating of parallel straight lines record ing the interference fringes formed by the incident coherent light on a photosensi tive surface at the specified angles with each other. CONSTITUTION:A substrate which can be cut is preferable and an SiO2 or Al substrate which can be etched is used in the case of adopting photolithography. An exposure is increased with a positive type resist and conversely the exposure is decreased with a negative type resist and the substrate itself is etched in such a manner that the valleys of the grating arrive at the substrate. The resist is removed and such substrate is used as the scale. The scale is formed by vapor deposition or sputtering of a metal onto the same in order to reinforce the scale in the case of using the resist as it is. The gratings smaller by one digit than the conventional microspheres which are visible promiscuously in the visual field are visible continuously with the scale made in the above-mentioned manner and therefore the exact size of a material is easily known simply by placing the same alongside the material and viewing the scale with an optical microscope.
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