发明名称 PHOTOSENSITIVE COMPOSITION FOR NEGATIVE TYPE LITHOGRAPHIC PLATE
摘要 PURPOSE:To enhance ink receptivity by incorporating a specified monomer and a specified copolymer in a polymer. CONSTITUTION:The polymer contains (a) a monomer selected from (meth) acrylamides and (meth) acrylates to be added, preferably, in an amount of 1-60 mol %, each having an aromatic hydroxyl group; (b) at least one kind of monomer to be added, preferably, in an amount of 3-30 mol.%, selected from (meth)acrylats and (meth) acrylamides each having an optionally substituted benzyl group; (c) (meth) acrylonitrile; and (d) an alpha, beta-unsaturated carboxylic acid copolymer having an acid value of 10-100, thus permitting the obtained photosensitive composition to be developed with an aqueous solution of alkali, and improved in ink receptivity.
申请公布号 JPS61284759(A) 申请公布日期 1986.12.15
申请号 JP19850125461 申请日期 1985.06.10
申请人 FUJI PHOTO FILM CO LTD 发明人 MISU HIROSHI;NISHIKAWA NOBUO;SEKIYA TOSHIYUKI;AOTANI NORIMASA
分类号 G03F7/038;G03F7/016;G03F7/021;G03F7/027;G03F7/033 主分类号 G03F7/038
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