THIN FILM FORMATION DEVICE

摘要

PURPOSE:To prevent the fine powder of a reaction product from infiltrating into an exhaust system by positioning an aperture end part of an exhaust port provided to a vessel in a rear side of an opposite face of both an electrode and a substrate. CONSTITUTION:In the inside of a vessel 2, a pipeline 32 is individually connected to an exhaust port 9 and an aperture end part 31 thereof is positioned in a rear side of an opposite face of both an electrode 4 and a substrate 1. Thereby both the Si fine powder 22 of a reaction product which is stuck on an inside wall region 21 of the vessel 2 and an activated seed which is formed in an activated seed generation region 33 of an opposite region of the substrate 1 and the electrode 4 are prevented from infiltrating into the inside of the exhaust port 9. Therefore the inside of the vessel 2 is maintained in the prescribed pressure and an amorphous Si film excellent in film quality is formed.