| 摘要 |
PURPOSE:To supply a steel strip having the temp. uniform in the transverse direction to a vapor deposition chamber for continuous vacuum deposition of the steel strip by providing plural differential pressure chambers before and behind the vacuum deposition chamber and maintaining the sealing gas to be fed therein at the same temp. as the temp. of the steel strip. CONSTITUTION:The plural differential pressure chambers 3, 4, 5 are disposed before the vacuum deposition chamber 6 for continuous vacuum deposition of the steel strip 1 and the plural differential pressure chambers 8, 9 are disposed behind the same. The sealing gas controlled in temp. is fed through a supply pipe 14 to the front of the above-mentioned inlet side differential pressure chamber groups 3, 4, 5 of the continuous vacuum deposition device. The mixing with the low-temp. gas to be admitted from a pretreatment installation 2 is prevented. The sealing gas flows through the differential pressure chamber groups 3, 4, 5 of the low pressure, the vapor deposition chamber 6 and the differential pressure chamber group in this order and is sucked by a vacuum pump.
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