| 摘要 |
PURPOSE:To improve the sensitivity of an X-ray resist in the atmospheric exposure by a method wherein an X-ray resist is applied with a thin film containing polyvinyliden chloride as a constituent, and X-ray is projected onto a material to be processed through the tin film. CONSTITUTION:An X-ray resist 6 applied on a material to be processed 5 is further coated with a thin film 8 containing polyvinyliden chloride as a constituent. The thin film containing polyvinyliden chloride as a constituent has very small permeation coefficient of oxygen and acts as a kind of oxygen shield film capable of shielding oxygen, thereby removing a factor to decrease the efficiency of the reaction between the X-ray resist 6 and the X-ray 2, without decrease in the sensitivity of the X-ray resist even in the atmospheric exposure. |
