发明名称 POLYMER COMPOSITION FOR PHOTORESIST
摘要 The novel polymers disclosed have the formula: <IMAGE> or <IMAGE> wherein R1 is R5-(z)p; R5 is a terminal reactive group -O-; z is -isocyanate-O-; p is zero or 1, however p is zero when m is zero; P 1 is an organic radical; m is zero or 1, however m is zero when n is 1; R2 is an organic radical; i is an integer from 2 to 6; P2 is an organic radical; r is zero or 1, however r is zero only when m is zero and n is zero; R3 is an organic radical; P4 is the residue from a polyhydroxy compound; n is zero or 1; R4 is -(v)w-R6; v is -O-isocyanate; w is zero or 1, however, w is zero when m is zero; and R6 is -O- terminal reactive group. The polymers are preferably made by first reacting a dianhydride with a polymer having terminal hydroxy groups and then reacting the reaction product with a hydroxy group terminated acrylate or methacrylate or a hydroxy group terminated hydrogen donor containing at least one heterogeneous atom such as O, N, or S. Polymer compositions comprising these polymers have been found to be very useful as photoresists in producing printed circuit boards.
申请公布号 AU5750386(A) 申请公布日期 1986.12.11
申请号 AU19860057503 申请日期 1986.05.16
申请人 GRACE, W.R. + CO. 发明人 WEI YUAN LIN
分类号 C08G63/00;C08G18/67;C08G18/81;C08G63/68;C08G63/91;C08G64/42;C08G65/00;C08G65/32;G03F7/038 主分类号 C08G63/00
代理机构 代理人
主权项
地址