发明名称 |
DRY ETCHING DEVICE AND METHOD |
摘要 |
A dry etching method and device involve induction of a magnetic field having field lines perpendicular to an electric field by magnets which are arranged in the vicinity of a cathode within a reaction chamber, on the surface of the cathode being placed a sample to be etched by a plasma of an etchant gas. |
申请公布号 |
DE3175576(D1) |
申请公布日期 |
1986.12.11 |
申请号 |
DE19813175576 |
申请日期 |
1981.11.25 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OKANO, HAROUO;HORIIKE, YASUHIRO |
分类号 |
H01J37/34;(IPC1-7):H01J37/32;H05H1/16;H01L21/302 |
主分类号 |
H01J37/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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