发明名称 METHOD OF SUPPLYING GAS TO VACUUM TREATING CHAMBER
摘要 PURPOSE:To prevent extraneous matters from being scattered by the gas present within stop valves of a gas supplying system or within a gas supplying tube, by evacuating the part of the gas supplying tube on the downstream side of a controller provided with an orifice after stopping the supply of gas to the vacuum chamber and before restarting to supply the gas. CONSTITUTION:Upon completing treatment of a material in a vacuum chamber 30, a control unit 40 closes a stop valve 13 and completely closes the orifice of a controller MFC provided with an orifice 12. The unit 40 then closes stop valves 14 and 15, whereby a gas supplying tube 11 on the downstream side of the MFC12, that is between the orifice of the MFC12 and the valve 14 is kept vacuum. After the treated material is exchanged with a new material in the treating chamber 30, the valves 14 and 15 are first opened and then the valve 13 is opened. In such a manner, extraneous matters are prevented from being scattered by the gas present within the valves 14 and 15 of the gas supplying system or within the supplying tube 11.
申请公布号 JPS60169138(A) 申请公布日期 1985.09.02
申请号 JP19840022807 申请日期 1984.02.13
申请人 HITACHI SEISAKUSHO KK 发明人 TANAKA YOSHIE;SAIKAI MASAHARU;OGAWA YOSHIFUMI;TSUJIMOTO KAZUNORI
分类号 B01J4/02;C23C16/44;C23C16/455;C23C16/50;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 B01J4/02
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