| 摘要 |
PURPOSE:To form a fine pattern with a device for mixing a developing soln. and cleaning liquid, spraying the mixture to a negative resist and developing the same by controlling the flow rates of the respective liquids from the start till the end of development in such a manner as to coincide with set values. CONSTITUTION:The developing soln. 1 is fed via a pump 7, a flow rate control valve 9 and a flowmeter 11 to a pipe 5. The cleaning liquid 2 is also fed via pump 8, a flow rate control valve 10 and a flowmeter 12 to a pipe 5. The liquid mixture composed of the developing soln. and the cleaning liquid is sprayed from a spraying nozzle 6 onto a sample 16 under rotation to develop and clean the same. The flow rates of the developing soln. and the cleaning liquid are detected. The flow of the respective liquids are so controlled 13 as to attain the preset flow are ratio; for example, the flow rate ratio of the developing soln. and the cleaning liquid is so controlled continuously as to attain 3;1 at the start and 1:3 at the end. Since the flow rates of the developing soln. and the cleaning liquid are controlled by continuously changing the same, the formation of the fine pattern of the negative resist is made possible without the volume change in the exposing part of the sample. |
