| 摘要 |
PURPOSE:To enhance heat resistance of a photosensitive material and to enable microfabrication by incorporating terminal hydroxyphenylated ladder polysiloxane (HPLS) having specified photosensitive groups as side chains and a photosensitizer. CONSTITUTION:The terminal hydroxyphenylated ladder polysiloxane (HPLS) has at least 2 photosensitive groups in one molecule as side chains represented by the formula shown on the right in which X is H, methyl, or phenyl, and n is 0-4. This compound (HPLSV) obtained by attaching said side chains to HPLS can be obtained, for example, by hydrolyzing phenyltrichlorosilane and vinyltrichlorosilane. A mixture of this compound HPLSV and the photosensitizer is applied to a glass plate or the like, and exposed to form a pattern, thus permitting the obtained photosensitive material to be hardened by exposure and enhanced in heat resistance, and accordingly, this photosensitive material to be used for forming an insulating layer or a passivated layer and this layer to be microfabricated. |
