| 摘要 |
PURPOSE:To form the title magnetic recording element with good productivity and without contaminating a substrate by impressing a bias voltage on the substrate through an electrically conductive brush sliding along with the substrate while rotating the substrate and forming a magnetic film having vertical magnetic anisotropy on the substrate by sputtering. CONSTITUTION:The inside of a puttering chamber is evacuated to 2X10<-7> Torr and gaseous Ar is introduced to keep the pressure at 5X10<-3> Torr. A shutter 11 is placed above a target 7, a high-frequency voltage is impressed on cathode 8 to generate high-frequency discharge and sputtering is carried out for 1 hr. Then the shutter 11 is opened and a magnetic thin film is formed on a revolving substrate 1. Meanwhile, a bias voltage is impressed on the surface of the magnetic thin film being formed through a conductive brush 3, a substrate holder 6 and an anode 4. Consequently, excellent vertical magnetic anisotropy is generated by the effect of bias sputtering over the whole surface of the formed magnetic thin film.
|
