| 摘要 |
PURPOSE:To control defects such as graphite patches produced owing to the decrease of ammonia content in a graphite solution, by using an ammonia water of a specific density as a developing solution for a washing and removing process of the unexposed portions of a photoresist. CONSTITUTION:Some 5% of ammonia is included originally as a dispersion agent in a graphite solution for forming a graphite film, and the ammonia water can remove a photoresist up to about 98-99%. In the development with the present pure water washing, about 4% of a photoresist remains, which is dissolved and removed in a graphite solution sprayed in the following process of graphite film forming, and mixed in the recovered graphite solution as an impurity, causing to produce whitish stain (whitish fading) defects and the like. Therefore, an ammonia water of more than 10% density is applied to blow for a washing process.
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