发明名称 HIGH WITHSTAND-VOLTAGE SEMICONDUCTOR DEVICE
摘要 PURPOSE:To increase withstand voltage without extending a field ring region by forming a groove to the surface of a field ring region forming section and shaping the field ring resion in depth deeper than a base region in said groove region. CONSTITUTION:A high withstand-voltage bipolar transistor is constituted by an emitter region 1, a base region 2, a collector low-concentration region 5, a collector high-concentration region 6 and a field ring region 3 and the like in the same manner as a conventional device, but a groove 4 is shaped to the surface of a field ring region forming section, and the field ring 3 is formed in depth deeper than the base region 2 in the region of the groove 4. Accordingly, a bipolar transistor, withstand voltage of which is made higher than the conventional device without extending the field ring region, can be acquired.
申请公布号 JPS61276260(A) 申请公布日期 1986.12.06
申请号 JP19850117113 申请日期 1985.05.30
申请人 NEC CORP 发明人 HATTORI MASAYUKI
分类号 H01L29/73;H01L21/331;H01L29/72;H01L29/732 主分类号 H01L29/73
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