| 摘要 |
PURPOSE:To obtain high conversion efficiency and high-speed response characteristics by forming a Schottky electrode to a meshy shape. CONSTITUTION:A Schottky electrode 2 is formed to a meshy shape so that a substrate 1 is exposed partially and beams are injected efficiently. Such a mesh Schottky electrode 2 can be shaped by using a device such as an electron beam exposure device and a technique such as a photolithographic technique. According to such constitution, the thickness of the Schottky electrode 2 is thickened comparatively and resistivity is reduced, and a time constant R.C determined by the resistance value R and junction capacitance C of the Schottky electrode 2 is also minimized, thus acquiring high-speed response characteristics. The bias voltage of the Schottky electrode 2 and carrier concentration are set properly, thus overlapping the depth of depletion layers 4 among several mesh by adjusting the depth of the depletion layers 4, then improving conversion efficiency. |
