| 摘要 |
PURPOSE:To obtain a resist suitable for manufacture of semiconductor elements, etc., and superior in oxygen plasma resistance and resolution by bringing an org. lithium compd. into contact with a p-methylstyrene polymer, and then reacting a specified silicon compd. to give silicon-contg. repeating units. CONSTITUTION:The resist to be narrow in a mol.wt. distribution, enhanced in resistances to dry etching and oxygen plasma by introduction of silicon, and capable of forming a minute resist pattern with high precision can be obtained by reacting alkyl lithium, such as methyl lithium, for example, with poly-p-methylstyrene, and then, allyldimethylchlorosilane or the like with it to obtain the resist composed of the styrene type polymer having repeating units represented by the formula shown on the right in which R<1>, R<2>, and R<3> are each, same or different, 1-6C alkyl or 2-6C alkenyl, and one or more of them are alkenyl. |
